Method for preparation of multi-layer structure film

Details Method for preparation of multi-layer structure film Method for preparation of multi-layer structure film

1986-12-24

1989-04-04

Childs, Sadie

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 451, 4272481, 427249, 427255, 4272551, 4272557, 437225, B05D 306, C23C 1622

Patent

active

048185604

ABSTRACT:
A method for preparing a multi-layer structure film by forming a deposited film according to the chemical vapor depostion method comprises introducing a subjective starting material gas (A) which is the major flow rate component and an objective starting material gas (B) which is the minor flow rate component and hydrogen externally activated into a reaction space and controlling periodically the amount of said objective starting material gas (B) introduced to thereby form a deposited film with a multi-layer structure.

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