X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1996-03-06
1998-02-17
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 85, H01J 3500
Patent
active
057199159
ABSTRACT:
Two kinds of substances are deposited on the surface of a substrate with their thicknesses being gradually decreased according to a Fresnel pattern to form a deposited material. The material is sliced in a direction parallel to the direction of deposition of the two kinds of substance. The slice is fixed as an interference plate on the surface of a dispersing crystal in order to obtain an X-ray dispersing/focusing device. The interference plate fixed on the surface of the dispersing crystal focuses photons by the Fresnel diffraction during the incidence and reflection of X-rays to and from the dispersing crystal, and acts as a dispersing/focusing device as a whole. The dispersing crystal also acts as a base plate supporting the interference plate. Since an interference plate with an outermost zone width of the Fresnel pattern of 1 nm or less is producible, the focusing of X-rays to small regions can be realized.
REFERENCES:
patent: 2679474 (1954-05-01), Pajes
patent: 4243398 (1981-01-01), Nomura et al.
Richard M. Bionta et al, "Hard X-ray Sputtered-Sliced Phase Zone Plates," Applied Physics Letters, vol. 64, No. 8 (Feb. 21, 1994), pp. 945-947.
V.V. Aristov et al, "Bragg Zone Plates for Hard X-ray Focusing," Nuclear Instruments and Methods in Physics Research, A261, Nos. 1-2 (Nov. 1, 1987), pp. 72-74.
Koike Masaki
Suzuki Isao
Agency of Industrial Science and Technology
Porta David P.
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