Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1985-10-18
1987-03-17
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
528153, 534556, 430323, 430326, G03F 726
Patent
active
046507418
ABSTRACT:
Disclosed herein is a positive photosensitive composition comprising a 1,2-naphthoquinone diazide compound and a binder resin comprising a novolak resin containing as condensation components .beta.-naphthol, or .alpha.-naphthol and p-cresol.
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Miura Konoe
Nagasaka Hideki
Ochiai Tameichi
Takahashi Noriaki
Takasaki Ryuichiro
Bowers Jr. Charles L.
Mitsubishi Chemical Industries Limited
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