Metal treatment – Compositions – Heat treating
Patent
1985-06-14
1987-03-17
Roy, Upendra
Metal treatment
Compositions
Heat treating
29572, 29576B, 148175, 148187, 357 30, H01L 3106, H01L 21265
Patent
active
046505245
ABSTRACT:
An amorphous silicon film having a PIN junction inside in parallel to the film surface is formed extending continuously over transparent film electrodes in each plurality of regions being formed and spaced from each other on one main surface of a light transmissive substrate. A laser beam having a wave length covering a substantially ultraviolet rays region and a visible rays region is irradiated from the other main surface side of the light transmissive substrate to an adjacent spacing portion where the amorphous silicon film is to be divided and the amorphous silicon film lying therein is removed, thus the amorphous silicon film is divided into each plurality of regions. An aluminum electrode film is formed continuously covering the amorphous silicon film portions in each region. The laser beam is irradiated from the other main surface side of the light transmissive substrate to the adjacent spacing portion where the aluminum electrode film is to be divided and the aluminum electrode film lying therein is removed, thus the aluminum electrode film is divided in each plurality of regions. The divided aluminum film electrodes are connected to the transparent film electrodes in the adjacent regions, accordingly a plurality of photoelectric converting regions formed on the light transmissive substrate are connected in series.
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patent: 4292092 (1981-09-01), Hanak
patent: 4456490 (1984-06-01), Dutta et al.
patent: 4514579 (1985-04-01), Hanak
patent: 4517403 (1985-05-01), Morel et al.
patent: 4517733 (1985-05-01), Hamano
patent: 4528065 (1985-07-01), Yamazaki
patent: 4534804 (1985-08-01), Cade
Imai Hideki
Kiyama Seiichi
Roy Upendra
Sanyo Electric Co. Ltd
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