Infrared detector element substrate with superlattice layers

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

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257 18, 257 19, 257 22, 257201, H01L 2906, H01L 310328, H01L 310336

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active

055369480

ABSTRACT:
A substrate upon which infrared elements are formed has a crystalline base layer, preferably comprised of silicon; a first strain superlattice layer formed upon the base layer; and a first matched superlattice layer formed upon the strain superlattice layer. The strain superlattice layer and the matched superlattice layer mitigate defect propagation from the base layer to the infrared detector elements. Optionally, a plurality of additional or second strain and matched superlattice layers are formed in an alternating layer configuration upon the first matched superlattice layer so as to achieve enhanced defect filtering.

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