Heating chamber

Details Heating chamber Heating chamber

1994-11-22

1996-07-16

Hoang, Tu

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

219390, 219549, H05B 366

Patent

active

055369197

ABSTRACT:
A heating chamber for use in diffusion reactors employed in the semiconductor industry. An inner chamber is formed within an insulative layer. The proximal ends of separators are embedded in this insulative layer with the distal ends extending into the inner chamber. Support rods inserted through holes in the proximal ends and embedded in the layer of insulation secure and align the ceramic separators. The distal end of each ceramic separator has an indentation adapted to restrain a resistance wire at a designated distance from the insulative layer while providing space for wire expansion towards the insulative layer. The wire is preferably restrained at distances of between 0.05 and 24 inches from the insulative layer. The entire assembly is wrapped with additional insulative blankets and enclosed within a stainless steel shell.

REFERENCES:
patent: 4668478 (1987-05-01), Homer et al.
patent: 4849608 (1989-07-01), Muraoka et al.
patent: 5095192 (1992-03-01), McEntire et al.

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