Isobutane oxidation in the presence of a soluble propylene glyco

Organic compounds -- part of the class 532-570 series – Organic compounds – Oxygen containing

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568575, 568910, 5689105, 502171, C07C17902

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active

048017558

ABSTRACT:
The oxidation of isobutane in the presence of a novel, soluble propylene glycol/vanadium catalyst is disclosed. Tertiary-butyl alcohol, tertiary-butyl hydroperoxide, and acetone are produced. A significant increase in isobutane conversion is obtained without a large decrease in selectivity to tertiary-butyl alcohol and tertiary-butyl hydroperoxide using a small amount of catalyst. Tertiary-butyl alcohol is useful as a gasoline additive and tertiary-butyl hydroperoxide is used for the production of propylene oxide. Acetone has a variety of uses as well.

REFERENCES:
patent: 2265948 (1941-12-01), Loder
patent: 2780654 (1957-02-01), Robertson et al.
patent: 2845461 (1958-07-01), Winkler et al.
patent: 3474151 (1969-10-01), Grane
patent: 3825605 (1974-07-01), Johnston
patent: 3832149 (1974-08-01), Kozlowski et al.
patent: 3974228 (1976-08-01), Barone
patent: 4028423 (1977-06-01), Brownstein et al.
patent: 4296262 (1981-10-01), Grane et al.
patent: 4296263 (1981-10-01), Worrell
patent: 4328365 (1982-05-01), Slinkard et al.
patent: 4569925 (1986-02-01), Yang et al.
patent: 4722919 (1988-02-01), Marquis et al.

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