Diverter magnet arrangement for plasma processing system

Details Diverter magnet arrangement for plasma processing system Diverter magnet arrangement for plasma processing system

1985-11-29

1987-04-14

Schor, Kenneth M.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 204298, 20419232, 219121PG, C23C 1450, C23C 1436

Patent

active

046576193

ABSTRACT:
A flat book-shaped substrate support electrode for a magnetically enhanced plasma processing apparatus has primary magnetic poles at first and second ends for generating a primary magnetic field that extends between the ends of the electrode in front of a processing surface of the electrode. An auxiliary magnet structure is spaced from the processing surface for generating an auxiliary magnetic field that tends to flatten the primary magnetic field. A diverter magnet generates a third magnetic field having curved lines of force centered on an axis spaced from a first edge of the electrode toward which electron drift occurs. The third magnetic field interacts with the resultant of the primary field and the auxiliary field at the first edge of the electrode and acts to stabilize the plasma in this region.

REFERENCES:
patent: 4581118 (1986-04-01), Class et al.

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