Semiconductor mask and method of manufacturing the same

Details Semiconductor mask and method of manufacturing the same Semiconductor mask and method of manufacturing the same

1995-06-27

1998-02-17

Chea, Thorl

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 24, 430313, 430321, G03F 900

Patent

active

057189900

ABSTRACT:
A mask and method of manufacturing is disclosed. The mask may include a transparent quartz substrate having light-transmitting regions and light-shielding regions, a light-control layer formed on the substrate excluding a portion corresponding to a light-transmitting region of an edge portion, and a light-shielding layer formed on the light-control layer of an light-shielding region. The method may include the steps of preparing a quartz substrate, forming a light-control layer on the quartz substrate, forming a light-shielding layer on the light-shielding region of the light-control layer, and selectively etching the light-control layer corresponding to light-transmitting regions of an edge portion of the substrate.

REFERENCES:
patent: 5376483 (1994-12-01), Rolfson

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