Method of projection exposure

Details Method of projection exposure Method of projection exposure

1999-01-29

2000-06-27

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430 22, G03F 900

Patent

active

06080517&

ABSTRACT:
Disclosed is a projection exposure apparatus which is able to realize stabilized focusing control which presents highly followable performances for the photosensitive substrate with few irregularities and will work without failure even for a photosensitive substrate having rough irregularities. A determining section determines whether the velocity instructions data obtained by a difference between a detected position of the substrate and a target position and a difference between the detected tilt of the substarate and a target tilt falls within respective predetermined allowable ranges. During the affirmative judgment by the determining section, a controller performs focusing and leveling control with high precision. When the determining section makes a negative judgment, the controller effects focusing control with the tilt of the wafer kept at constant.

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patent: 5569930 (1996-10-01), Imai
patent: 5602400 (1997-02-01), Kawashima
patent: 5654553 (1997-08-01), Kawakubo et al.
patent: 5659384 (1997-08-01), Ina

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