Semiconductor exposure method and apparatus, and a reticle there

Details Semiconductor exposure method and apparatus, and a reticle there Semiconductor exposure method and apparatus, and a reticle there

1998-04-28

2000-06-27

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

060805129

ABSTRACT:
A pattern exposure and transfer method wherein a reticle has a pattern, including a chromium pattern, to be transferred, the chromium pattern of the reticle having a thickness, with respect to a wavelength .lambda., which is approximately N.multidot..lambda./2 or N.multidot..lambda., where N is a positive integer. The reticle is illuminated with light having a center wavelength .lambda., whereby the pattern of the reticle is transferred onto a photosensitive substrate through a projection optical system. The transfer of the reticle pattern is executed in a state of illumination .sigma. such that no sub-peak appears in an optical image.

REFERENCES:
patent: 5284724 (1994-02-01), Noelscher et al.

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