Photomask and exposure apparatus using the same

Photocopying – Projection printing and copying cameras – Step and repeat

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Details

355 43, 355 54, G03B 2742

Patent

active

046573798

ABSTRACT:
A photomask includes a pattern region including a predetermined original image pattern, a pair of mark regions which respectively include alignment marks located on a line crossing the pattern region and which are located at two sides of the pattern region, and a pair of light-shielding regions each of which has at least the same width as that of a corresponding one of the mark regions along a direction parallel to the line.
An exposure apparatus for sequentially exposing a plurality of regions on a photosensitive substrate by using a projection image on the photomask includes means for moving the photosensitive substrate and the photomask relative to each other such that images of marks for a current projection image are projected on a portion of a nonexposed region of a previous projection image, the portion being located next to a previous mark latent image and the nonexposed region being located between the latent image of the previous original image pattern and the latent image of the previous mark.

REFERENCES:
patent: 4295735 (1981-10-01), Lacombat et al.
patent: 4362385 (1982-12-01), Lobach
patent: 4402596 (1983-09-01), Kanatani
patent: 4408875 (1983-10-01), Majima

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