Mask having a phase shifter and method of manufacturing same

Details Mask having a phase shifter and method of manufacturing same Mask having a phase shifter and method of manufacturing same

1990-10-05

1994-11-08

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430323, G03F 900

Patent

active

053625919

ABSTRACT:
There is disclosed a mask which includes a first phase shifter layer and a second phase shifter layer formed on the first phase shifter layer and has a structure capable of easily effecting highly precise control of the phase of exposure light and correction for a defect in the phase shifter layers. There are also disclosed a method of manufacturing the mask and a method of forming by use of the mask a pattern which has a smaller local error in pattern dimension and is free of a defect.

REFERENCES:
patent: 4906326 (1990-03-01), Amemiya et al.
patent: 5045417 (1991-09-01), Okamoto
patent: 5087535 (1992-02-01), Hirokane et al.

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