Solid state image sensor comprising photoelectric converting fil

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357 30, 357 31, 357 32, 357 58, 357 41, 357 45, 357 2, H01L 2980

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active

045890030

ABSTRACT:
A solid state image sensor including a substrate, an epitaxial layer grown on the substrate, an opaque bottom electrode applied on the epitaxial layer, a photoconductor film deposited on the bottom electrode, a transparent surface electrode applied on the photoconductor film, a reading-out SIT formed in the epitaxial layer and a resetting MOS-FET also formed in the epitaxial layer. A gate diffusion region of the reading-out SIT is connected to the bottom electrode and a source region of resetting MOS-FET is also connected to the bottom electrode. A source electrode connected to the source region of the reading-out SIT is extended under the bottom surface, while an insulating layer is interposed therebetween to form a capacitance. Charge carriers stored in the gate region of the reading-out SIT can be read-out to derive a large output voltage due to the amplifying function of the reading-out SIT.

REFERENCES:
patent: 4363963 (1982-12-01), Ando
patent: 4377817 (1983-03-01), Nishizawa et al.
patent: 4419604 (1983-12-01), Ishioka et al.
patent: 4429325 (1984-01-01), Takasaki et al.
Physics of Semiconductor Devices, pp. 313, 433, 434, Author--S. M. Sze.

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