Process for the preparation of metal nitride coatings from singl

Details Process for the preparation of metal nitride coatings from singl Process for the preparation of metal nitride coatings from singl

1994-08-31

1997-01-07

King, Roy V.

Coating processes

Coating by vapor, gas, or smoke

4271261, 427314, C23C 1600

Patent

active

055914837

ABSTRACT:
Metal nitride coatings are deposited effectively by the decomposition of single source metal imido-amidoamine precursors perpared by the reaction of a pentavalent metal halide with a primary amine or hydrazine. With hydrazine-derived precursors, TaN coatings may be deposited at temperatures as low as 400 degrees Celcius or lower.

REFERENCES:
patent: 5194642 (1993-03-01), Winter et al.
patent: 5344948 (1994-09-01), Verkade
patent: 5409735 (1995-04-01), Winter et al.
"Preparation of Niobium and Tantalum Organo-imido Complexes from Reactions of the Pentahalides with Amines, etc.", Bates, et al, Polyhedron, vol. 4, No. 8, pp. 1391-1401, 1985.
"Chemical Vapor Deposition of Vanadium, Niobium, and Tantalum Nitride Thin Films", Fix, et al, Chem.Mater., 1993, No. 5, pp. 614-619.
"Low Temperature Deposition of Metal Nitrides by Thermal Decomposition of Organometallic Compounds", Sugiyama, et al, J. Electochem Soc., vol. 122, No. 11, p. 1545 (1975).
"Deposition of Tantalum Nitride Thin Films From Ethylimidotantalum Complex", Chiu and Chang, Journal of Materials Science Letters 11 (1992) pp. 96-98.
"Structure and Electrical Properties of Ta and Ta Nitrides Deposited by Chemical Vapour Deposition", K. Hieber, Thin Solid Films, 24 (1974) pp. 157-164.
"Transition Temperatures and Crystal Structures of Single-Crystal and Polycrystalline NbN.sub.x Films", Oya and Onodera, Journal of Applied Physics, vol. 45, No. 3 Mar., 1974, pp. 1389-1397.
"Chemical Vapor Deposition of Tantalum Nitride Films", Takahashi, et al, Journal of the Less-Common Metals, 52 (1977) pp. 29-36.
"Single-Source Precursors to Niobium Nitride and Tantalum Nitride Films", Winter, et al, Mat.Res.Soc.Symp.Proc., vol. 327 (1994) pp. 103-108.
"Single-Source Precursors to Vanadium Nitride Thin Films", Winter, et al, Mat.Res.Soc.Symp.Proc., vol. 327 (1994) pp. 109-113.
"[TiCl.sub.4 (NH.sub.3).sub.2 ]: An Improved Single-Source Precursor to Titanium Nitride Films", Winter, et al, Inorganic Chemistry, vol. 33, No. 6, 1994 pp. 1227-1229.

Affiliated with

Also associated with

Rating

Process for the preparation of metal nitride coatings from singl does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the preparation of metal nitride coatings from singl, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the preparation of metal nitride coatings from singl will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1762452