Photomask

Details Photomask Photomask

1991-06-18

1993-07-20

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 430325, G03F 900

Patent

active

052292304

ABSTRACT:
In a photomask, a rectangular pattern to be transferred to a resist film and a plurality of auxiliary patterns are provided in a light shielding layer which is formed on a transparent plate. The auxiliary patterns are spaced from the rectangular light-transmission pattern so that the Fresnel diffraction light from the auxiliary patterns and the zero-order diffraction light from the rectangular light-transmission pattern intensify each other at a position where a pattern corresponding to the rectangular light-transmission pattern is formed on the resist film. Thus, the light intensity of the pattern on the resist film is increased.

REFERENCES:
patent: 4764441 (1988-08-01), Ohta et al.
patent: 4777116 (1988-10-01), Kawatsuki et al.
patent: 5045417 (1991-09-01), Okamoto
Pat. Abstract 83-790097/42, Levenson, Image Resolution of Photolithographic Transmission Mask . . . , 1983.

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