Positive working photosensitive composition and photosensitive e

Details Positive working photosensitive composition and photosensitive e Positive working photosensitive composition and photosensitive e

1991-04-29

1993-06-29

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430192, 430193, 430326, 534557, 525459, G03F 7023, G03F 732, C08F28304

Patent

active

052233731

ABSTRACT:
Disclosed is a photosensitive quinone diazide compound for the preparation of a two component positive working photosensitive electrodeposition composition. As the photosensitive group is grafted on a polyurethane, the photosensitive compound thus synthesized has good flexibility and good compatability with acrylic resin. The electrodeposition composition also has good adhesion to the metal base plate when it is coated thereon by electrodeposition means.

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patent: 5080998 (1992-01-01), Irving et al.

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