Process for depositing the deposition agent on the surface of a

Details Process for depositing the deposition agent on the surface of a Process for depositing the deposition agent on the surface of a

1974-03-29

1976-02-17

Ozaki, G.

Metal treatment

Process of modifying or maintaining internal physical...

Chemical-heat removing or burning of metal

148186, 148187, H01L 744

Patent

active

039390179

ABSTRACT:
A novel process for depositing and diffusing an impurity on and into the surface of a number of semiconductor wafers placed in parallel on a quartz boat. The impurity source is formed as a plurality of long and slender bars or a unitary tunnel-shaped element or a plurality of tunnel segments obtained by cutting the element apart. The impurity source as described above is mounted about the periphery of the semiconductor wafers arranged in a row on a quartz boat for reducing the consumption of the impurity source.

REFERENCES:
patent: 2956913 (1960-10-01), Mack et al.
patent: 3314833 (1967-04-01), Arndt et al.
patent: 3362858 (1968-01-01), Knopp
patent: 3374125 (1968-03-01), Goldsmith
patent: 3604694 (1971-09-01), Muller

Affiliated with

Also associated with

Rating

Process for depositing the deposition agent on the surface of a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for depositing the deposition agent on the surface of a , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for depositing the deposition agent on the surface of a will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1744835