Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1975-12-10
1977-01-11
Mack, John H.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
75134F, 75170, 252 6255, 340174TF, 360131, 427132, 428457, C23C 1500, B05D 512
Patent
active
040025462
ABSTRACT:
An improved method of making a magnetic recording medium with excellent coercive force and rectangular ratio is provided by means of an ion plating technique. A support and an evaporation source of a magnetic Co-Si alloy are placed in an ion plating apparatus which is filled with an inert gas and kept at low vacuum. High voltage is then applied between the support and the evaporation source such that the former has a negative polarity and the latter a positive polarity, thereby causing a glow discharge zone in the apparatus. The magnetic alloy is evaporated into the glow discharge zone from the source to form a magnetic thin film on the support. Such a magnetic thin film can have a coercive force of 750 Oe or more and a rectangular ratio of 0.80 or more and can be used as a magnetic recording medium.
REFERENCES:
patent: 3772174 (1973-11-01), Spalvins
patent: 3898952 (1975-08-01), Shirahata et al.
patent: 3928159 (1975-12-01), Tadokoro et al.
patent: 3929604 (1975-12-01), Shirahata et al.
Kitamoto Tatsuji
Shirahata Ryuji
Suzuki Masa-aki
Fuji Photo Film Co. , Ltd.
Mack John H.
Weisstuch Aaron
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