Electricity: electrical systems and devices – Safety and protection of systems and devices – High voltage dissipation
Patent
1996-10-30
1998-06-16
Gaffin, Jeffrey A.
Electricity: electrical systems and devices
Safety and protection of systems and devices
High voltage dissipation
361 56, 361111, H02H 100
Patent
active
057680833
ABSTRACT:
A glass-to-metal hermetic seal device which is adapted for suppressing or dissipating electrostatic energy comprises an improved glass-to-metal hermetic seal, with the interior of the device incorporating and creating a gas-filled electrical discharge tube. The gas is an ionizable gas and may conveniently comprise a mixture of nitrogen and Argon. The devices of the present invention utilize one or more electrodes which enter the gas-filled chamber, and when the electrical field of sufficiently high potential is created within the gas-filled chamber, the gas ionizes and becomes conductive so as to effectively dissipate the field.
REFERENCES:
patent: 1269534 (1918-06-01), Gray
patent: 1603279 (1926-10-01), Gray
patent: 1897587 (1933-02-01), Pirani
patent: 1990180 (1935-02-01), Gaidies
patent: 2397982 (1946-04-01), Salzberg
patent: 2492295 (1949-12-01), Knochel
patent: 2540399 (1951-02-01), Linkroum et al.
patent: 3711735 (1973-01-01), Foster
patent: 3875467 (1975-04-01), Riedel
patent: 5061877 (1991-10-01), Akanuma
patent: 5111110 (1992-05-01), Yagi et al.
patent: 5367956 (1994-11-01), Fogle, Jr.
patent: 5391961 (1995-02-01), Tsuchiya et al.
Johnson Steven W.
Maki Kenneth C.
McCarron Douglas P.
Gaffin Jeffrey A.
Jackson Stephen W.
Tekna Seal, Inc.
LandOfFree
Method of suppressing electrostatic energy in glass-to-metal her does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of suppressing electrostatic energy in glass-to-metal her, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of suppressing electrostatic energy in glass-to-metal her will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1733022