Method of growing quaternary or pentanary alloy semiconductor la

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148DIG65, 148DIG97, 148DIG160, 148DIG169, 156612, 437110, 437111, 437126, 437133, H01L 21203, H01L 2938

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048331015

ABSTRACT:
Group III-V multi-alloy semiconductors, such as ternary, quaternary, and pentanary semiconductors, grown on a binary group III-V compound semiconductor substrate, are used as an active layer in opto-devices, high electron mobility transistors, etc. A method of growing multilayers, lattice-matched to the binary substrate and having specific energy band gaps, includes a molecular beam epitaxy (MBE) process. The present invention includes growing a quaternary or pentanary semiconductor layer using a minimum number of effusion cells and eliminating readjustment of molecular beam intensities from one layer to another layer during a series of epitaxial growth steps. As an example of quaternary growth, four effusion cells are utilized and two combinations of three effusion cells are alternately operated, one including an Al effusion cell and the other including a Ga effusion cell. Each of the three effusion cells is capable of growing a ternary semiconductor lattice-matched to the substrate. Two groups of pulsed molecular beams, each pulse having a width corresponding to a growth time less than that required to grow three atomic layers, grow a quaternary alloy semiconductor also lattice-matched to the substrate. Similarly, a method of growing a pentanary alloy semiconductor utilizing five effusion cells in a MBE system can be employed.

REFERENCES:
patent: 4159919 (1979-07-01), McFee et al.
patent: 4261771 (1981-04-01), Dingle et al.
patent: 4476477 (1984-10-01), Capasso et al.
patent: 4566918 (1986-01-01), Irvine et al.
patent: 4654090 (1987-03-01), Burnham et al.
patent: 4675708 (1987-06-01), Onabe
patent: 4675709 (1987-05-01), Scifres et al.
Gossard et al., "Epitaxial Structures with Alternate-Atomic-Layer Composition Modulation," Appl. Phys. Lett., vol. 29 No. 6, Sep. 15, 1976, pp. 323-325.
Capasso et al., "Doping . . . Tunable Heterojunction Banier Heights . . . by Molecular Beam Epitaxy", Appl. Phys. Lett., vol 46 No. 7, Apr. 1, 1985, pp. 664-366.
Sakaki et al., "One Atomic Layer Heterointerface . . . in GaAs-AlAs Quantum Well . . . in Molecular Beam Epitaxy," Jpn. J. Appl. Phys., 24(6), Jun. 1985, pp. L417-L420.
Tanaka et al., "Atomic-Scale . . . Heterointerfaces in GaAs-Al.sub.x Ga.sub.L-X As . . . by Molecular Beam Epitaxy . . ." Jpn. J. Appl. Phys., 25(2), Feb. 1986 pp. L155-L158.
Japanese Journal of Applied Physics, vol. 25, No. 3, Mar. 1986, "MBE Growth of InGaAlAs Lattice-Matched to InP by Pulsed Molecular Beam Method", Fujii et al., pp. L254-L256, *Page L254, paragraphs 3, 5, 6; page L255, paragraph 1*.
Applied Physics Letters, vol. 43, No. 8, Oct. 1983, "Optical Properties of GaInAs/AlInAs Single Quantum Wells", Welch et al., pp. 762-764.
Journal of Crystal Growth, vol. 44, No. 1, Aug. 1978, "Crystal Growth Kinetics In (GaAs)n-(AlAs)m Superlattices Deposited by Molecular Beam Epitaxy", by Petroff et al., pp. 5-13.
Applied Physics Letters, vol. 46, No. 7, Apr. 1985, "GaSb0.5As0.5/Al0.35Ga0.65Sb0.48As0.52 Superlattice Lattice Method Matched to InP Prepared by Molecular Beam Epitaxy", Tsang et al., pp. 659-661.

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