Multiple detector alignment system for photolithography

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

2505593, 2502081, 356401, G01N 2186

Patent

active

057675236

ABSTRACT:
A positioning, alignment, and image quality system comprising a detector having a photosensitive surface covered with an opaque layer having predetermined openings therein, a matched reticle having predetermined apertures therein is used to project the image of the apertures onto the openings. A plurality of different detectors are thereby formed on a single monolithic substrate for providing positioning, alignment, and image quality information. Different sub-detectors provide general positioning information, fine alignment or position information, and image quality information, such as optimum focus and astigmatism. In one embodiment, a pair of rectangular openings having a predetermined distance therebetween is used. An illumination pattern is projected between the rectangular openings filling a portion of the rectangular openings thereby providing a signal. The signals from the two openings are balanced or made equal to obtain positioning information or alignment of the reticle and the detector, and correspondingly a wafer stage attached to the detector. Different opening configurations in the opaque mask covering the photosensitive layer are used to provide different imaging information. The present invention permits alignment information to be obtained in a non-scanning system, as well as in a system using pulsed illumination sources. Additionally, a plurality of sub-detectors may easily be fabricated onto a monolithic detector providing different functions.

REFERENCES:
patent: 4504148 (1985-03-01), Kuroki et al.
patent: 4545683 (1985-10-01), Markle
patent: 4549084 (1985-10-01), Markle
patent: 4578590 (1986-03-01), Wu
patent: 4579453 (1986-04-01), Makita
patent: 4697087 (1987-09-01), Wu
patent: 5463216 (1995-10-01), Van Berkel
patent: 5477057 (1995-12-01), Angeley et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Multiple detector alignment system for photolithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multiple detector alignment system for photolithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multiple detector alignment system for photolithography will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1728871

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.