High-purity cleaning system, method, and apparatus

Details High-purity cleaning system, method, and apparatus High-purity cleaning system, method, and apparatus

1987-05-21

1989-05-23

Pal, Asok

Cleaning and liquid contact with solids

Processes

Hollow work, internal surface treatment

134 10, 134 21, 134 2219, 134 254, 134 26, 134 37, 134 42, B05B 500

Patent

active

048327530

ABSTRACT:
A system for high purity cleaning of components includes a cleaning chamber which is maintained at a pressure above ambient atmospheric pressure. A gas-glide transporter extends through the cleaning chamber and includes a pair of slightly tilted elongate tubes having a plurality of tiny holes therein. The tubes communicate with a source of filtered pressurized nitrogen. A tray for carrying components to be cleaned is adapted to fit on the tubes and slide down the transporter on a frictionless cushion of nitrogen. Components are cleaned of very small particles by using a high pressure spray of individual droplets of solvent which knock the particles off the component to be cleaned. The particles, solvent and solvent vapor are swept away from the component being cleaned by a stream of dry, filtered air. The cleaning chamber group includes a control panel which controls solvent supply and recovery modules. The cleaning chamber group is modular so that it may be placed in a Class 100 environment.

REFERENCES:
patent: 4443269 (1984-04-01), Capella et al.
patent: 4606774 (1986-08-01), Morris

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