Image projection method and semiconductor device manufacturing m

Details Image projection method and semiconductor device manufacturing m Image projection method and semiconductor device manufacturing m

1995-06-07

1997-05-20

Dzierzynski, Paul M.

Optical: systems and elements

Diffraction

Using fourier transform spatial filtering

359558, 359619, 355 53, 355 67, G02B 518, G02B 2746, G03B 2742, G03B 2754

Patent

active

056317735

ABSTRACT:
An edge emphasis type phase shift reticle is illuminated obliquely, and zeroth order diffraction light and first order diffraction light caused by a fine pattern of the reticle and having substantially the same intensity are incident and distributed on a pupil of a projection optical system, symmetrically with respect to a predetermined axis, whereby the fine pattern is imaged with use of the zeroth order diffraction light and first order diffraction light.

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