Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1998-07-08

2000-11-28

Lee, John R.

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

250548, 355 30, H01L 2130, G03B 2742

Patent

active

061538779

ABSTRACT:
An object of a inventions of the present application is raising the pattern position precision by stabilizing the temperature of a reticle or a reduction lens in a projection aligner. The projection aligner comprises a reticle stage with a reticle, a light source emitting light to the reticle, a reduction lens projecting the light onto the wafer via the reticle, and a temperature control unit controlling the temperature of the reticle or/and a reduction lens by a clean air.

REFERENCES:
patent: 5877843 (1999-03-01), Takagi et al.
patent: 5975816 (1999-11-01), Endo
patent: 5995263 (1999-11-01), Tokuda et al.

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