Liquid coating composition for use in forming photoresist coatin

Details Liquid coating composition for use in forming photoresist coatin Liquid coating composition for use in forming photoresist coatin

1995-04-26

1997-05-20

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Processes of preparing a desired or intentional composition...

526206, 526214, 526225, 526236, C08L10104, C08F 244

Patent

active

056313144

ABSTRACT:
A liquid coating composition for forming an anti-interference film over a photoresist film is prepared by combining a water-soluble, film-forming component with a specified fluorosurfactant or by combining said water-soluble, film-forming component with a fluoro-surfactant and a specified anionic surfactant. A coating film is formed from said liquid coating composition over a photoresist film to produce a photoresist material of a dual structure. The photoresist material is particularly effective in lessening the multiple-interference effect of light, thereby enabling the formation of very fine resist patterns having high fidelity to mask patterns.

REFERENCES:
patent: 4293657 (1981-10-01), Nissen et al.
patent: 4910122 (1990-03-01), Arnold et al.

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