Plasma generating apparatus employing capacitive shielding and p

Details Plasma generating apparatus employing capacitive shielding and p Plasma generating apparatus employing capacitive shielding and p

1991-10-10

1993-08-10

Nguyen, Nam X.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723, 20429834, C23C 1500, C23F 100

Patent

active

052345297

ABSTRACT:
A plasma generating apparatus includes a plasma containing region and an R.F. coil for generating R.F. electric fields within the plasma region for creating a plasma from a gas flowed through the region. A capacitive shield is disposed between the coil and the plasma region for limiting the amount of capacitive coupling while not completely eliminating it, between the R.F. coil and the plasma region. The shield can include a means for varying the shielding effect thereof during processes employing the plasma.

REFERENCES:
patent: 4918031 (1990-04-01), Flamm et al.

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