Apparatus for heat treating an object

Details Apparatus for heat treating an object Apparatus for heat treating an object

1999-06-02

2000-11-28

Wilson, Pamela

Drying and gas or vapor contact with solids

Apparatus

For diverse operations on treated material

34 72, 34 76, 34202, 34218, 34231, F26B 1900

Patent

active

061517941

ABSTRACT:
An apparatus for heat treating an object and specifically a substantially flat object described. The apparatus may be a hot plate post-baking apparatus for heat treating a substantially flat object such as a photomask used in a semiconductor photolithographic process. The apparatus is provided with an upper heat reflector plate that is equipped with upwardly curved edge portions such that the amount of heat reflected by the reflector can be controlled and the center region on the substantially flat object can be temperature compensated for achieving more uniform temperature profile across the entire surface of the mask. By utilizing the heat reflector plate in a post-baking apparatus, the normally observed 5.degree. C. temperature difference across a mask surface is substantially eliminated.

REFERENCES:
patent: 5226242 (1993-07-01), Schwenkler
patent: 5462603 (1995-10-01), Murakami
patent: 5504831 (1996-04-01), Sandhu et al.
patent: 5588827 (1996-12-01), Muka
patent: 5855077 (1999-01-01), Nam et al.

Affiliated with

Also associated with

Rating

Apparatus for heat treating an object does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for heat treating an object, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for heat treating an object will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1712485