Phase shifting mask and a manufacturing method therefor

Details Phase shifting mask and a manufacturing method therefor Phase shifting mask and a manufacturing method therefor

1997-11-04

1999-06-22

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

059142049

ABSTRACT:
A phase shifting mask and manufacturing method therefor has an improved step coverage by forming a shielding layer pattern by way of a phase shifting layer. The phase shifting mask includes an optically transmitting substrate, and a transmitting pattern and a non-transmitting pattern formed onto the substrate, in which the transmitting pattern has a linewidth more than a limit resolution with respect to an exposure light, and the non-transmitting pattern has a line width below the limit resolution with respect to the exposure light.

REFERENCES:
patent: 5328807 (1994-07-01), Tanaka et al.
patent: 5397663 (1995-03-01), Uesawa et al.
Levenson, M., "Improving Resolution in Photolithography with a Phase-Shifting Mask," IEEE Transactions on Electron Devices, vol. ED29, No. 12 (Dec. 1982) pp. 57-60.

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