Chemistry: electrical and wave energy – Processes and products
Patent
1985-06-05
1986-12-23
Chapman, Terryence
Chemistry: electrical and wave energy
Processes and products
204434, G01N 2742, G01N 2740
Patent
active
046311165
ABSTRACT:
A method for monitoring the minor constituents present in a plating bath solution which affect plating deposit properties. The method involves applying a predetermined dc potential to a working electrode positioned within the plating bath solution. A constant ac signal is superimposed on the dc potential. The dc potential is varied at a predetermined rate over a predetermined range, which includes potentials which plate and strip the plating deposit. The ac current of the applied ac signal is measured between the working electrode and a counter electrode positioned within the plating bath solution as the dc potential is varied over the predetermined range. The measurement of the ac current in relation to varying dc potential is expressed as an ac current spectra or fingerprint. By optimizing all ac and dc measurement variables, spectra are obtained which contain fine structure and which enable the monitoring of minor plating bath constituents which affect plating deposit properties.
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"Cyclic Voltammetric Stripping Analysis of Acid Copper Sulfate Plating Baths" (Part 1 and 2) by R. Haak, C. Ogden & D. Tench, in Plating and Surface Finishing, Apr. 1981, pp. 52-55 and Mar. 1982, pp. 62-66.
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Chapman Terryence
Hughes Aircraft Company
Karambelas A. W.
Lachman M. E.
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