Method of adjusting the temperature of a semiconductor wafer

Details Method of adjusting the temperature of a semiconductor wafer Method of adjusting the temperature of a semiconductor wafer

1992-12-10

1993-12-14

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437248, 148DIG50, 156345, 156625, 156646, 118724, H01L 21465

Patent

active

052702669

ABSTRACT:
A method of adjusting the temperature of a semiconductor wafer comprising mounting and attracting the wafer on a susceptor in a process chamber, exhausting and decompressing the process chamber, controlling the temperature of the wafer to become equal to a process temperature while cooling or heating the susceptor, supplying process gas into the chamber to process the wafer with this process gas, and introducing CF.sub.4 gas into interstices between the wafer and the susceptor through the susceptor to allow heat exchange to be achieved between them. CF.sub.4 gas includes same components as at least some of those of the process gas and it is more excellent in heat transmitting characteristic than helium gas. Even when CF.sub.4 gas is leaked into a process area, therefore, any influence is not added to the process.

REFERENCES:
patent: 4261762 (1981-04-01), King
patent: 4384918 (1983-05-01), Abe
patent: 4457359 (1984-07-01), Holden
patent: 4508161 (1985-04-01), Holden
patent: 4512391 (1985-04-01), Harra
patent: 4615755 (1986-10-01), Tracy et al.
patent: 4771730 (1988-09-01), Tezuka
patent: 4842683 (1989-06-01), Cheng et al.
patent: 4931135 (1990-06-01), Horiuchi et al.
patent: 4949783 (1990-08-01), Lakios et al.
patent: 4963713 (1993-10-01), Horiuchi et al.
Sieradzki, Nuclear Instruments and Methods in Physics Research B6, 1985, pp. 237-242. "Air-Enhanced contact cooling of wafers".

Affiliated with

Also associated with

Rating

Method of adjusting the temperature of a semiconductor wafer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of adjusting the temperature of a semiconductor wafer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of adjusting the temperature of a semiconductor wafer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1705361