Transfer gate for photodiode to CCD image sensor

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Details

357 30, H01L 2978, H01L 2714, H01L 3100

Patent

active

050703803

ABSTRACT:
An image sensor formed on a P-type substrate includes a plurality of pinned diode photodiodes, a CCD shift register and a separate buried transfer gate located between each of the photodiodes and the CCD shift register. The photodetectors are arranged in at least one line. The CCD shift register extends along the line of photodetectors. Each of the pinned diode photodetectors includes a first region of N-type conductivity in the substrate and a second region of P+ type conductivity in the first region and along the substrate surface. The CCD shift register includes a channel region of N-type conductivity in the substrate surface and two sets of conductive gates along the channel region and insulated from the substrate surface. Each transfer gate includes a transfer channel region of N-type conductivity in the substrate and extending along the substrate surface from the shift register channel region to the first region of its respective photodetector. Each gate of one of the sets of shift register gates may have a portion which extends over the transfer gate channel region.

REFERENCES:
patent: 4032952 (1977-06-01), Ohba et al.
patent: 4151539 (1979-04-01), Barron et al.
patent: 4724470 (1988-02-01), Van Santen et al.

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