Ion implantation of zirconium alloys with hafnium

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating

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20419216, 427 38, 2504921, C23C 1448

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active

048490822

ABSTRACT:
An implantation method for the improvement of the corrosion resistance and hydrogen absorption resistance of zirconium alloys in a light water nuclear reactor environment includes the steps of sputtering a layer of hafnium ions onto a zirconium alloy and the implanting the hafnium ions with xenon doses of 3.times.10.sup.16 ions/cm.sup.2.

REFERENCES:
patent: 3600797 (1971-08-01), Bower et al.
patent: 3900636 (1975-08-01), Curry et al.

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