Design rule test apparatus for testing if mask pattern satisfies

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364489, 364488, G06F 1560

Patent

active

052259935

ABSTRACT:
An improved computer aided design (CAD) apparatus is disclosed for properly determining if a mask pattern for a large-scale integrated circuit (LSI) satisfies a predetermined design rule. This CAD apparatus includes a figure feature file for storing in advance the feature of the configuration of a contact hole region which should not be recognized as a design error. After a conventional design recognizing process has been conducted, a recognition invalidation process is effected by referring to the figure feature file. Accordingly, the detection of a pseudo-error which is not an essential error is reduced, so that the efficiency of a designing operation with this apparatus is improved.

REFERENCES:
patent: 4441207 (1948-04-01), Lougheed et al.
patent: 4510616 (1985-04-01), Lougheed et al.
patent: 5062054 (1991-10-01), Kawakami et al.
"Panamap-B: A Mask Verification System for Bipolar TC" by Yoshida et al., IEEE 18th Design Automation Conf., 1981, pp. 690-695.
"Programs for Verifying Circuit Connectivity of MOS/LSI Mask Art Work" by Takashima et al., IEEE 19th Design Automation Conf., 1982, pp. 544-550.
"MACH: A High-Hitting Pattern Checker for VLSI Mask Data", Tsukizoe et al., IEEE 20th Design Automation Conference, 1983.

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