Press for treating products under high pressure

Plastic article or earthenware shaping or treating: apparatus – Means to create a vacuum or apply fluid pressure within a...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

425 77, B30B 1100, B30B 1502

Patent

active

039334180

ABSTRACT:
A press for treatment of material includes a high pressure chamber formed of a vertical high pressure cylinder having end closures projecting into the cylinder and a press stand with a clear opening which is somewhat greater than the length of the high pressure chamber when the end closures are fully inserted. The high pressure cylinder is mounted on a carrying device which can move it into the clear opening of the press stand with gaps between the press stand and the end closures. One of the end closures is constituted by a piston slidable in the high pressure chamber. This piston has an annular portion which is slidable in an annular space formed at the end of the high pressure cylinder. Fluid under pressure can be supplied to the space on the side of the annular projection facing away from the high pressure cylinder to move the piston into the high pressure chamber and holding it there during movement of the high pressure chamber into the press stand, whereafter such pressure fluid can be released.

REFERENCES:
patent: 3550199 (1970-12-01), Landa
patent: 3591903 (1971-07-01), Bowles
patent: 3730666 (1973-05-01), Bowles
patent: 3832100 (1974-08-01), Baxendale

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Press for treating products under high pressure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Press for treating products under high pressure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Press for treating products under high pressure will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1693711

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.