Chemical vapor deposition apparatus of in-line type

Details Chemical vapor deposition apparatus of in-line type Chemical vapor deposition apparatus of in-line type

1990-11-20

1994-02-22

Hearn, Brian E.

Coating apparatus

Gas or vapor deposition

Work support

118715, 118722, 118719, 118723I, 156345, H01L 2100

Patent

active

052883299

ABSTRACT:
An in-line type chemical vapor deposition apparatus having an etching device for cleaning at least substrate holders, which is provided downstream of the substrate unloading station in which the processed substrates are removed from the substrate holders at atmosphere pressure. The etching device comprises a plasma etching means in which the substrate holders are positioned on an anode side or a dry-etching means in which the substrate holders are positioned on a cathode side, thereby reducing the down time of the apparatus without any influence of an exfoliation of an adhered film from the substrate holders or other portions.

REFERENCES:
patent: 4618477 (1986-10-01), Babu et al.
patent: 4709655 (1987-12-01), Van Mastrigt
patent: 4816113 (1989-03-01), Yamazaki
patent: 4824545 (1989-04-01), Arnold et al.
patent: 4857139 (1989-08-01), Tashiro et al.
patent: 4895107 (1990-01-01), Yano et al.

Affiliated with

Also associated with

Rating

Chemical vapor deposition apparatus of in-line type does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical vapor deposition apparatus of in-line type, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical vapor deposition apparatus of in-line type will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-168367