Exposure apparatus

Details Exposure apparatus Exposure apparatus

1996-05-31

1999-11-30

Metjahic, Safet

Photocopying

Projection printing and copying cameras

Step and repeat

355 72, G03B 2742

Patent

active

059951982

ABSTRACT:
The present invention relates to an exposure apparatus for printing a predetermined pattern on a mask onto a substrate whose surface is coated with a photosensitive material such as resist. The exposure apparatus according to the present invention comprises a special alignment system which effectively suppresses interference of alignment light, offset drift, and the like which may occur due to the resist, thereby realizing highly accurate alignment.

REFERENCES:
patent: 4659225 (1987-04-01), Takahashi
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4937618 (1990-06-01), Ayata et al.
patent: 4948254 (1990-08-01), Ishida
patent: 4982227 (1991-01-01), Suzuki
patent: 5100237 (1992-03-01), Wittekoek et al.
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5194893 (1993-03-01), Nishi
patent: 5381210 (1995-01-01), Hagiwara
patent: 5404222 (1995-04-01), Lis
patent: 5473410 (1995-12-01), Nishi
patent: 5751403 (1998-05-01), Mizutani et al.
patent: 5781277 (1998-07-01), Iwamoto

Affiliated with

Also associated with

Rating

Exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1679832