Mask containing subresolution line to minimize proximity effect

Details Mask containing subresolution line to minimize proximity effect Mask containing subresolution line to minimize proximity effect

1998-03-18

2000-02-08

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 30, G03F 900

Patent

active

060226447

ABSTRACT:
A electrical connection structure pattern according to the present invention includes a relatively dense first electrical connection structure area to a second electrical connection structure area. First, the electrical connection structure pattern is expensed to generate a first dummy pattern. The area of the first dummy pattern is larger than that of electrical connection structure pattern. Next, a second dummy pattern is generated by narrowing the line width of the first dummy pattern. A third dummy pattern is obtained by using CAD. The area of the third dummy pattern is smaller than that of the second dummy pattern, but larger than that of the electrical connection structure pattern. A fourth dummy pattern is generated by using CAD to remove the overlap area between the second dummy pattern and the third dummy pattern.

REFERENCES:
patent: 5879844 (1999-03-01), Yamamoto et al.

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