Positive photoresist composition comprising a novolak resin havi

Details Positive photoresist composition comprising a novolak resin havi Positive photoresist composition comprising a novolak resin havi

1995-03-06

1996-02-27

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430193, 528153, 528155, G03F 7023

Patent

active

054947731

ABSTRACT:
A positive photoresist composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound is described, wherein the alkali-soluble novolak resin contains a novolak resin to be obtained by condensing a mixture of (a) at least one phenol represented by the following formula (1) and at least one compound represented by the following formula (2) and (b) at least one aldehyde: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different and each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an aralkyl group, an alkoxycarbonyl group or an arylcarbonyl group; R.sub.4, R.sub.5, R.sub.6 and R.sub.7 are the same or different and each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an alkenyl group, an aryl group or an aralkyl group; and n represents an integer of from 4 to 7.

REFERENCES:
patent: 4123279 (1978-10-01), Kobayashi
patent: 4690882 (1987-09-01), Tanigaki et al.
patent: 5225310 (1993-07-01), Stahlhofen et al.
patent: 5395727 (1995-03-01), Uetani et al.

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