Photodetector

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Light responsive structure

Patent

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Details

257431, 257432, 257448, 257466, H01L 310328

Patent

active

059947241

ABSTRACT:
A photodetector design is disclosed for preventing an electrode from being broken. A recess portion is formed in a semiconductor substrate. A light absorbing layer is formed in the recess portion, and a buffer layer is formed on the light absorbing layer. A contact layer is formed on the buffer layer. The height of the light absorbing layer can be set to minimize the effect of a step caused by facet formation. An insulating layer is formed outside of a recess portion to project from a main surface of the substrate. The anode electrode is formed on the insulating layer and substantially outside of the recess and, as a result, the electrode is less likely to be broken.

REFERENCES:
patent: 4507674 (1985-03-01), Gaalema
patent: 4847210 (1989-07-01), Hwang et al.
patent: 5576221 (1996-11-01), Takemura et al.
patent: 5726440 (1998-03-01), Kalkhoran et al.
M. Sugiyama, et al., "A selective epitaxial SiGe/Si planar photodetector for Si-based OEICs", IEEE, pp. 583-586, 1995.

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