Thin-film transistor and method for fabricating same and liquid

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material

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257 61, 257 66, 257 72, 257350, H01L 2904, H01L 31036, H01L 310376, H01L 3170

Patent

active

059947179

ABSTRACT:
A thin-film transistor including a gate electrode provided on a substrate, a gate insulation film provided on the gate electrode, an operative semiconductor film provided on the gate insulation film, and a channel protection film provided on the operative semiconductor film. Semiconductor contact portions are disposed so that they are covered by the channel protection film on either side of the operative semiconductor film. A source electrode and a drain electrode are connected to the semiconductor contact portions on either side of the channel protection film. The thin-film transistor can minimize the stray capacitance due to the overlapping of the source and drain electrodes with the gate electrode and is excellent in the contact characteristic. Also, a method for fabricating a thin-film transistor is disclosed.

REFERENCES:
patent: 4849797 (1989-07-01), Ukai et al.
patent: 5371398 (1994-12-01), Nishihara
patent: 5637519 (1997-06-01), Tsai
patent: 5773848 (1998-06-01), Wu et al.
patent: 5780903 (1998-07-01), Tsai et al.
patent: 5828082 (1998-10-01), Wu
patent: 5834797 (1998-11-01), Yamanaka

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