Heating – Accessory means for holding – shielding or supporting work...
Patent
1994-03-24
1996-02-27
Lo, Weilun
Heating
Accessory means for holding, shielding or supporting work...
432152, 1566621, 427344, 4273744, 427404, 427275, C03C 1500
Patent
active
054944392
ABSTRACT:
A silicon/silicon carbide material which eliminates contamination by outgassing and direct contact is described as well as wafer processing pans made of this material and wafer processing methods using the silicon/silicon carbide material. An ultraclean silicon/silicon carbide material may be formed by first forming a Si/SiC part by prior art methods. The Si/SiC part then is subjected to a temperature sufficient to cause the impurities within the silicon carbide to either react and/or diffuse into the silicon fill. The contaminated silicon fill is then removed, either by high temperature evaporation or by a chemical etch. Clean silicon is then impregnated within the pore space of the silicon carbide pan. The part which results has ultraclean silicon and silicon carbide grains which have most, if not all, of the impurities removed from the surface of the grains. Thus, an ultraclean material results which will not outgas or directly contaminate silicon wafers.
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Goldstein Michael
Shim Cari H.
Intel Corporation
Lo Weilun
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