Method to accurately correlate defect coordinates between photom

Details Method to accurately correlate defect coordinates between photom Method to accurately correlate defect coordinates between photom

1998-07-24

2000-03-14

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

382144, G03F 900

Patent

active

060370874

ABSTRACT:
A method and apparatus for calibrating the coordinate systems of photomask processing machines improves processing efficiency and the quality of resulting photomasks. A test pattern is printed on an unproductive area of the photomask. The test pattern is used to calibrate the coordinate system of each processing machine on which the photomask is mounted. Using the test pattern as a common reference point enables points located using one processing machine to be quickly and accurately found on a second processing machine. The test pattern is also used as a reference for other metrology measurements.

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