Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1997-09-04
1999-11-30
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
G03F 900
Patent
active
059940026
ABSTRACT:
A resist pattern is formed with a phase-shifting mask 4 in which transparent regions through an opaque region are different 180.degree. in phase from one another. In this case, when positive resist 1 is subjected to exposure, the widths of the opaque regions 5A and 5B of the mask 4 are changed according to a pattern adjacent thereto, so that a fine pattern having the same line width is formed with high accuracy.
REFERENCES:
patent: 5546225 (1996-08-01), Shiraishi
patent: 5573890 (1996-11-01), Spence
Matsushita Electric - Industrial Co., Ltd.
Rosasco S.
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