Pattern data processing apparatus for sewing machine

Boots – shoes – and leggings

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Details

11212112, 112458, G06F 1546, D05B 2100

Patent

active

053553195

ABSTRACT:
For each of a plurality of frame patterns, pattern data of the frame pattern, position data of character patterns and data of a maximum number of character patterns are stored in a memory. When an arbitrary one of the frame patterns and a plurality of arbitrary character patterns are selected, data composition is performed such that the selected character patterns are combined with the frame pattern at a predetermined position on the condition that the number of such character patterns is limited to the maximum number for the selected frame pattern.

REFERENCES:
patent: 4391212 (1983-07-01), Tamiya et al.
patent: 4413574 (1983-11-01), Hirota et al.
patent: 4417531 (1983-11-01), Doyama
patent: 4502402 (1985-03-01), Kato
patent: 4522137 (1985-06-01), Takenoya et al.
patent: 4602583 (1986-07-01), Hanyu
patent: 4742786 (1988-05-01), Hashimoto et al.
patent: 4834007 (1989-05-01), Miyazaki et al.
patent: 5016550 (1991-05-01), Horie et al.
patent: 5074232 (1991-12-01), Matsubara et al.
patent: 5097779 (1992-03-01), Ishikawa et al.

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