Lithography processing apparatus for manufacturing semiconductor

Details Lithography processing apparatus for manufacturing semiconductor Lithography processing apparatus for manufacturing semiconductor

1997-11-26

1999-11-30

Grant, William

Boots, shoes, and leggings

36446827, G06F 1900, H01L 2130

Patent

active

059930438

ABSTRACT:
A semiconductor device manufacturing apparatus includes a processing device, a measuring device, and a data server. The processing device performs a lithography process and outputs process record data containing product information about a semiconductor device and process information. The measuring device measures a record offset from a target value in the semiconductor device processed by the processing device, and outputs measurement record data. The data server stores the process record data from the processing device and the measurement record data from the measuring device, calculates a correction value on the basis of a past record offset in response to a request from the processing device, and sends it back to the processing device. The data server has a data storage unit for storing the process record data and the measurement record data, a data arrangement unit for arranging the data stored in the data storage unit in accordance with stratification conditions, and determining target data from the data arranged by stratum on the basis of new process record data from the processing device, and a correction value calculation unit for performing calculation for the target data to obtain a correction value.

REFERENCES:
patent: 4829444 (1989-05-01), Saitou et al.
patent: 4835704 (1989-05-01), Eichelberger et al.
patent: 5657235 (1997-08-01), Liebmann et al.
patent: 5798937 (1995-09-01), Bracha et al.
patent: 5825647 (1996-03-01), Tsudaka

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