Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1994-12-14
1996-07-30
Utech, Benjamin
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
427569, 427 77, 427271, H05H 100
Patent
active
055409580
ABSTRACT:
A method of manufacturing a microscope probe tip comprises the steps of depositing a first material over a substrate, such as silicon oxide over a silicon substrate using chemical vapor deposition. The first material is patterned to define at least one structural protrusion. During this patterning, the first material is etched back. Then a second material, such as silicon oxide, is deposited over the protrusion using an electron cyclotron resonance (ECR) process, which grows a sloped surface to form the microscope probe tip. In another aspect of the invention, two different resolution Atomic Force Microscope (AFM) probe tips are grown. Then, the cantilevers are coupled together to provide an AFM with two probe tips having different resolutions.
REFERENCES:
patent: 4906840 (1990-03-01), Zdeblick et al.
patent: 4978421 (1990-12-01), Bassous et al.
patent: 5279865 (1994-01-01), Chebi et al.
patent: 5382274 (1995-01-01), Yamamoto et al.
patent: 5508066 (1996-04-01), Akahori
Bothra Subhas
Weling Milind G.
Utech Benjamin
VLSI Technology Inc.
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