Trace metals analysis in semiconductor material

Optics: measuring and testing – With sample preparation

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356311, G01N 100

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049125281

ABSTRACT:
A method for analyzing and quantifying the individual trace metals content of a semiconductor material in the low to sub-parts per billion (ppba) range. The method comprises (A) float-zone refining of a sample of the semiconductor material creating a melt zone containing essentially all the trace metals of the sample; (B) cooling the melt zone to form a solid zone concentrated in trace metals; (C) separating the solid zone concentrated in trace metals from the sample of the semiconductor material; (D) converting the solid zone concentrated in trace metals into a form suitable for trace metals analysis; (E) analyzing the solid zone with known trace metals analytical techniques; and (F) calculating total trace metals from these analytical results. This method can also be applied to the small tip which forms on the side of the solid zone.

REFERENCES:
patent: 3954336 (1976-05-01), Baird et al.
patent: 4338029 (1982-07-01), Macourt
Dietze et al., "Float-Zone Grown Silicon"; Crystal Growth Properties and Applications, vol. 5, 1981.
Associated Industries Ltd. Publication 2030/A16, Oct. 1960.
Martin, Semiconductor Silicon, ed. by R. R. Haberecht, p. 547 (1969).
Heinen et al., Anal. Chem., 38(13), p. 1853 (1966).
Thompson et al., Anal. Chem., 30(6), p. 1023 (1958).
Stewart et al., Analyst, 108, p. 1450 (1983).
Taddia, Anal. Chim. Acta., 142, p. 333 (1982).
Fuller, Anal. Chim. Acta., 62, p. 261 (1972).
Dietz et al., Cryst.: Growth, Prop, Appl., 5 (1981), pp. 1-42.
Mollenkopf et al., DOE/JPL-954331-80/9, (Jan., 1980), pp. 54-55.
Kirk-Othmer, Encyclopedia of Chemical Technology, 2nd Ed., vol. 17, pp. 862-865.

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