Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1997-05-02
2000-03-14
El-Arini, Zeinab
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 13, 134 2, 134 3, 134 7, 134 254, 134 26, 134 28, 134 29, B08B 308, B08B 312, B08B 702
Patent
active
060367857
ABSTRACT:
Method [and apparatus ] for quickly and controllably removing chemical residues and particle accumulations from an exposed surface of an object. A slurry, containing a slurry liquid and containing small scrubber particles that optionally have a range of at least two distinct particle sizes, is directed at the exposed surface to remove most or all of the residues and accumulations from the exposed surface. The slurry flow may be pulsed or be relatively constant. The exposed surface of the object is then partly or fully submerged in a rinse liquid that includes a strong base and/or a strong oxidizing agent. The rinse liquid is subjected to ultrasonic wave motion with a chosen wave displacement direction, and the ultrasonic waves have one or more distinct wavelengths, chosen to cover a range of expected sizes of chemical residues, particle accumulations and/or scrubber particles to be removed. Optionally, the ultrasonic wave displacement direction is chosen approximately parallel to an exposed surface from which residues, accumulations and/or scrubber particles are to be removed. Optionally, the ultrasonic wavelength(s) may be varied with time over a selected range of wavelengths that cover the range of sizes of particles to be removed.
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El-Arini Zeinab
Schipper John
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