Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1988-10-20
1990-03-27
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204300R, 2041828, B01D 1302
Patent
active
049118170
ABSTRACT:
In an apparatus for electrophoresis, using a support for a gel and a liquid buffer, a plurality of driving electrodes arrayed in spaced relation to one another so as to contact the medium, and a plurality of sensing electrodes arrayed in spaced relation to one another and the driving electrodes so as to contact the medium. Each sensing electrode is preferably radially inward of and paired with a single one of the driving electrodes. Means are provided respectively for providing electrical potentials to be applied to selected ones of the driving electrodes, for applying the provided potentials, for sensing electrical potentials at selected ones of the sensing electrodes, and for adjusting the applied potentials to maintain the sensed potential at a selected value at a sensing electrode of each pair. The apparatus may be programmably controllable so as to enable an electric field to be modulated in amplitude and direction, as a function of time.
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Science, vol. 234, Dec. 19, 1986, pp. 1582-1585, "Separation of Large DNA Molecules . . . Fields", Gilbert Chu et al.
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Eastman Kodak Company
Niebling John F.
Ryser David G.
Schmidt Dana M.
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